发明名称 METHOD OF PEELING WAFER PROTECTIVE SHEET
摘要 <p>PURPOSE:To prevent the circuit breakdown by static electricity by automatically exfoliating and removing a protective sheet through an exfoliating mechanism, under bonding through an adhesive layer by a long conductive tearing tape consisting of flexible base material, and under earth processing through the tearing tape. CONSTITUTION:A tearing tape 3 is bonded with the rear 11 of a protective sheet 1. The bonding is done through an adhesive layer 33, and the bonding force of the adhesive layer 33 to the protective sheet 1 is set so that it may be higher than the bonding force of the protective sheet 1 to the circuit pattern formation face of a semiconductor wafer. The peeling method is the one of automatically peeling the protective sheet 1 through the tearing tape 3 and an exfoliating mechanism under the adhesion of the tearing tape 3 to the protective sheet 1 stuck to the circuit pattern formation face of the semiconductor wafer 4, and besides the processing is done under the earth processing 5 through the tearing tape 3. For example, in the condition that the semiconductor wafer 4 is fixed onto a fixing table 6 by sucking method, etc., the tearing tape 3 is shifted through a guide roll 7, whereby the protective sheet 1 on the semiconductor wafer 4 is peeled and removed automatically.</p>
申请公布号 JPH0385745(A) 申请公布日期 1991.04.10
申请号 JP19890223848 申请日期 1989.08.30
申请人 NITTO DENKO CORP 发明人 CHIKADA YASU;SHIGEMURA EIJI;KUWABARA YUTAKA;YAMAMOTO MASASHI;KUBOZONO TATSUYA
分类号 H01L21/683;B29C63/00;H01L21/00 主分类号 H01L21/683
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