The invention relates to a microwave cathode sputtering arrangement in which a cathode is disposed opposite a substrate. In the immediate vicinity of the substrate is located at least one magnetic field whose strength leads to an electron cyclotron resonance.
申请公布号
US5006219(A)
申请公布日期
1991.04.09
申请号
US19890413863
申请日期
1989.09.28
申请人
LEYBOLD AKTIENGESELLSCHAFT
发明人
LATZ, RUDOLF;SCHERER, MICHAEL;GEISLER, MICHAEL;JUNG, MICHAEL
