| 发明名称 |
SEMICONDUCTOR DEVICE OR SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURE, PROCESSING, OR DEVELOPMENT THEREOF AND PROCESSING USING ION BEAM AND MANUFACTURING OR PROCESSING DEVICE THEREFOR |
| 摘要 |
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| 申请公布号 |
JPH0325956(A) |
申请公布日期 |
1991.02.04 |
| 申请号 |
JP19890159582 |
申请日期 |
1989.06.23 |
| 申请人 |
HITACHI LTD;HITACHI VLSI ENG CORP |
发明人 |
TAKAHASHI TAKAHIKO;OKAMOTO YOSHIHIKO;HAMAMOTO MASATO;TAKEHANA YOICHI;OKAMOTO EMIKO;ITO FUMIKAZU;SHIMASE AKIRA;HONGO MIKIO;KAMIMURA TAKASHI;MIZUKOSHI KATSURO;AZUHATA SHOICHI;HASHIMOTO TAKAKO |
| 分类号 |
H01L21/3205;H01L21/82;H01L23/52 |
主分类号 |
H01L21/3205 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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