| 摘要 |
PURPOSE:To eliminate fluctuation in the intensity of exposure beam on a photoresist substrate and to enable exposure by the desired intensity of the exposure beam by detecting the exposure beam by an optical sensor provided on a moving optical system, monitoring and controlling the exposing quantity of head emission. CONSTITUTION:An exposing quantity detection part 12 on a moving optical system A receives exposing quantity monitor beam 11 reflected according to the reflection factor of a photoresist substrate 1. A detected exposing quantity correction part 16 divides an exposing quantity detection signal (c) by a reflection factor monitor signal (d) and calculates the detected exposing quantity when the reflection factor is 1. Then, the calculated quantity is outputted as a corrected detected exposing quantity signal (e). An optical modulator driving part 5 adjusts to outputs an optical modulator driving signal (f) so that an exposing quantity setting signal (b) can be coincident with the corrected detected exposing quantity signal (e). Then, an optical modulator 6 is driven and the intensity of laser beam 3 is adjusted. Thus, there is no fluctuation in the intensity of an exposure beam 7, with which the surface of the photoresist substrate 1 is irradiated, and the exposure can be executed by the desired intensity of the expo sure beam 7. |
