发明名称 SPIN DEVELOPMENT METHOD
摘要 PURPOSE:To form a uniform pattern by conducting a developing step of dropping developer of low concentration to a main surface while rotating a board at a low speed, and a developing step of dropping developer of standard concentration while rotating it at a reference speed. CONSTITUTION:In a first developing step, developer 2 diluted to 0.01 of normality is dropped on a rotating glass board while rotating a board 1, for example, at 150rpm. After 10 seconds are elapsed, in a second developing step, the rotating speed is raised to 450rpm, developer 2 of 0.20 of normality is dropped, and it is further developed for 70sec. Since the surface of the board is already covered with the developer 2 of 0.01 of normality and the affinity of the surface of the board 1 with the developer 2 is remarkably increased, the pulsating flow of the developer 2 when the developer 2 of 0.2 of normality is dropped is extremely reduced.
申请公布号 JPH02303116(A) 申请公布日期 1990.12.17
申请号 JP19890125611 申请日期 1989.05.18
申请人 NEC CORP 发明人 YAMADA YOSHIAKI
分类号 G03F7/30;H01L21/027;H01L21/30 主分类号 G03F7/30
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