| 摘要 |
PURPOSE:To stably execute a transcription operation without lowering resolving power by a method wherein, as an optimum correction state of a spherical aberration regarding an image to be formed on a wafer face of a pattern on a reticle, a positive tendency of a correction excess in a third-order region of the spherical aberration is set and a negative tendency of a correction deficit in a fifth-order region is set. CONSTITUTION:An operation means 20 finds, by means of an operation, an optimum diaphragm value of a reducing projection objective 4 on the basis of a fineness degree of a pattern on a reticle from a projection pattern information input means 12 or on the basis of information on an illumination condition from an illumination information input means 11. It sets a diaphragm of the reducing projection objective 4 to an optimum value by using a diaphragm control means 21, of sets a sigma value to an optimum value by working in conjunction with an illumination NA control means 22. A shape of a spherical-aberration curve is set to an optimum value by using an aberration-changing means 30 on the basis of the optimum value found by using the operation means 20 without an intermediary of a diaphragm information input means 13. Thereby, it is possible to stably transcribe even a fine pattern which is composed of various line widths without much lowering resolving power of a projection optical system. |
