Apparatus for even exposure of plants to sunlight

摘要

An apparatus for even exposure of potted plants to sunlight includes a base, a potted plant receiving platter rotatably mounted to said base with the platter having an upstanding peripheral flange bounding an interior portion of the platter. A shroud is mounted to the base and defines a cowl which overlies the platter's peripherlal flange to confine dirt and water to the interior portion of the platter. The platter has peripheral gear teeth and an electric motor and drive assembly is coupled to the platter for rotation thereof at predetermined timed intervals. An optional wheeled carriage can be mounted to the base with the carriage wheels rotatably coupled for movement of a plant across a support surface. A set of slave units including rotatable platters can be interconnected together and to a powered master unit for simultaneous rotation of many plants.