发明名称 ELECTRON BEAM EXPOSURE METHOD
摘要 PURPOSE:To ensure stable exposure constantly through control of the electron beam according to the results of the measurement thereof with the second slit when it passing through the first slit. CONSTITUTION:Electron beam emitted from the electron gun 1 is received by the second rectangular slit 5 after passing through the first rectangular slit 3 and a deflector 4. Current developed here is sent to a central processing unit 11 through a preamplifier 9 and an A-D converter 10, where it is compared with the preset value of the electron beam. The results are fedback to a heater transformer 7 through a D- A converter 81 to control the heater current. An alignment coil 2 corrects the electron beam if any abnormalty is found in the current density distribution, thereby dissolving the horizontal drift associated with the aging of the cathode section.
申请公布号 JPS556829(A) 申请公布日期 1980.01.18
申请号 JP19780078928 申请日期 1978.06.29
申请人 FUJITSU LTD 发明人 OSADA TOSHIHIKO
分类号 H01L21/027;H01J37/304 主分类号 H01L21/027
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