发明名称 APPARATUS
摘要 <p>An apparatus is described for effecting high temperature reactions between reactants comprising a reactor means (1), an open ended insert means (2) disposed within the reactor means and spaced from the walls thereof, gas inlet means (3) at one end of the reactor means for discharging into one end of the inlet means a jet of a gaseous mixture comprising at least one reactant and a plasma forming gas, outlet means (4) for the reaction product or products from the reactor means, and plasma discharge means (5, 6) for heating the gaseous medium by plasma discharge to an elevated temperature, the insert means being so disposed in relation to the gas inlet means that an extended path for gas is formed between the gas inlet means and the gas outlet means. This apparatus can be used, for example, to produce silicon carbide by reaction of silica or silicon monoxide with particulate carbons, produced for example by cracking a hydrocarbon, at a temperature in the range of from about 2000°K up to about 2350°K.</p>
申请公布号 WO1990010496(A1) 申请公布日期 1990.09.20
申请号 GB1990000394 申请日期 1990.03.16
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