| 摘要 |
PURPOSE:To perform accurate parallelism adjustments by utilizing a plane equation for a substrate to be exposed, and converting the height data of the substrate which are measured with optical measuring devices into the height data at the positions of tilt mechanisms by the operation of a microprocessor. CONSTITUTION:The following coordinates are set: the X-Y coordinates on the surface of a substrate to be exposed 4 with an arbitrary position as an original point; and the Z coordinate with a projected position 1a which forms a specified gap for an original mask plate as an original point. A plane equation zr=alphaxr+betayr+gamma which expresses the substrate is operated in a microprocessor based on the X-Y coordinate values (xr, yr) of optical measuring devices 3 provided at three points and the measured data zr of the height coordinate of the substrate 1. Thus the constants alpha, beta and gamma are computed. The data of alpha, beta and gamma and the X-Y coordinate values (xs, ys) of the tilt mechanisms 5 are imparted into the equation zs=alphaxs+betays+gamma. Thus the height coordinate value zs of the substrate 1 with respect to each tilt mechanism 5 is computed. The substrate 1 is moved in the vertical direction by the distance corresponding to the height coordinate value zs computed in each tilt mechanism. |
