| 摘要 |
PURPOSE:To obtain a good pattern profile having a high resolution by incorporating a specific quinone diazide ester compd. and a specific cresol formaldehyde novolak resin into the compsn. CONSTITUTION:A photosensitive agent and the alkaline soluble novolak resin are incorporated into the compsn. The photosensitive agent contains the 1,2- nephthoquinone diazide ester compd. of 2,4,4'-trihydroxybenzophenone of >=50mol% average degree of esterification. The alkaline soluble novolak resin is not particularly limited if the resin is the novolak resin soluble in an aq. alkaline soln. The resin obtd. by condensing a mixture contg. m-cresol, p-cresol and xylenol and the formaldehyde is used. The good resist profile is obtd. in this way and the excellent resolution is obtd. |
