发明名称 Particle manipulation system with stay-wet algorithm
摘要 A MEMS-based particle manipulation system which uses a particle manipulation stage and a sensor to detect when the sample volume is exhausted or nearly exhausted. The sensor sends a signal to a fluid control means that reverses the pressure between one of the output channels and the input channels, to keep the surfaces wet with a volume of the sample fluid. This volume can be maintained in the channel until an operator intervenes, or it can be repeatedly shuttled back and forth between the input channel and an output channel. By keeping the channels wet, material from the sample stream does not become adhered to the channel walls, which might otherwise irreversibly change or damage the device.
申请公布号 US9360164(B2) 申请公布日期 2016.06.07
申请号 US201414167566 申请日期 2014.01.29
申请人 Owl biomedical, Inc. 发明人 Foster John S;Martinez Nicholas C.;Shields Kevin E.;Spong Jaquelin K.
分类号 F17D3/01;B01L3/00;G01N35/08 主分类号 F17D3/01
代理机构 代理人 Spong Jaquelin K.
主权项 1. A particle manipulation system, comprising: a particle manipulating device fabricated on a silicon substrate; at least one microfabricated input channel upstream of the particle manipulating device and a sort output channel and a waste output channel downstream of the particle manipulating device, through which a sample fluid flows; a sensor that detects a dry or imminently dry condition within at least one of the microfabricated channels and puts out a signal when the condition is detected; a fluid control device for establishing a controlled forward flow between the at least one microfabricated input channel and at least one of the sort output channel and waste output channel, and then reversing the flow upon receiving the signal from the sensor; and wherein the particle manipulating device moves from a first position to a second position in response to a force, and wherein the motion is substantially in a plane parallel to the surface of the substrate and wherein at least one of the sort channel and the waste channel is substantially orthogonal to the surface and directly below at least a portion of the particle manipulating device over at least a portion of its motion.
地址 Goleta CA US