发明名称 |
Cathode sputtering system |
摘要 |
A cathode sputtering system comprising an annularly-shaped process chamber and a correspondingly annularly-shaped substrate carrier accommodated therein. The chamber and carrier are positioned vertically. A cathode station and a loading and unloading station are positioned on vertical walls of the chamber.
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申请公布号 |
US4938858(A) |
申请公布日期 |
1990.07.03 |
申请号 |
US19890386975 |
申请日期 |
1989.07.31 |
申请人 |
LEYBOLD AKTIENGESELLSCHAFT |
发明人 |
ZEJDA, JAROSLAV |
分类号 |
C23C14/34;C23C14/35;C23C14/56 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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