| 摘要 |
PURPOSE:To form a small scale exhaust gas even when the diborane gas as the raw material by depositing boron film on a substrate through glow discharge decomposition of diborane, causing an inactive gas ion to collide with such film considered as the target and adhering the emitted boron onto a heated base material. CONSTITUTION:A target 19 where a boron film is formed on the surface of stainless steel substrate is attached to an upper negative electrode 2 in the sputtering method and a base material 20 on which a boron film is to be formed is placed on a lower positive electrode 3. First, exhaustion adjusting valve 5 is fully opened, a reaction vessel 1 is vacuumed by the exhaust system, a gas flow adjusting device 10 and a reduction valve 22 are opened. Thereby, argon is supplied into the reaction vessel 1 from the argon gas bomb 21 to set the inside of vessel 1 to the specified pressure. Thereafter, a voltage is applied across both electrodes 2, 8 by a DC stabilized power supply 14 to generate glow discharge and a boron film is formed on the surface of a base material 20. Accordingly, a poisonous diborane is used only for manufacture of target and is not used for sputtering. |
