发明名称 METHOD OF MANUFACTURING A DEEP DRAUN CDT MASK
摘要 The electrode comprises a shadow mask blank having a pattern of apertures. The patterns are provided in a steel foil by means of a photo-etching process. Mask blanks are cut from the steel foil, with each blank having a pattern of apertures. In order to facitate subsequent drawing, a stack of mask blanks are annealed at a max. temp. above the temp. at which the blanks begin to stick together. Each mask blank is then deep-drawn to form an electrode. To separate annealed blanks while avoiding damage, the mask blanks are placed on a curved substrate before annealing, and are annealed off the substrate.
申请公布号 KR900004185(B1) 申请公布日期 1990.06.18
申请号 KR19820000674 申请日期 1982.02.16
申请人 NV PHILIPS CORP 发明人 BERGE ADRIANUS H M
分类号 C21D9/48;H01J9/14;(IPC1-7):H01J9/233 主分类号 C21D9/48
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