| 摘要 |
<p>PURPOSE:To prevent any trouble caused by entrainment of the air with a simplified structure without increasing the size of the device and complicating the same by providing a knob on a body which covers a wafer container therewith and is capable of suspending and supporting the container, and further providing a gas jet hole in said knob for feeding inactive gas into the body. CONSTITUTION:When a container 1 is conveyed into a diffusion furnace or a CVD furnace, a jig 4 is advanced toward the container 1 in which a wafer 2 is contained, and the jig 4 is lifted under the conditions that stopper pieces 3 disposed on the opposite sides of the container 1 are located in the jig 4. Thereupon, the stopper piece 3 engages a suspension piece 7 to perform the container 1 to be suspended from the jig 4. Hereby, the upper portion of the container 1 is covered with a body 5 of the jig 4 except for the tip end of the container. Further, inactive gas is jet from a gas jet hole 8, with which there is filled a space S covered with the container 1 and the body 5, and the inactive gas flows from the body 5 tip end to the outside of the body 5. In this situation, the container 1 is conveyed into the furnace and the jig 4 is pulled out from the furnace. Hereby, since the space S between the container 1 and the jig 4 is filled with the inactive gas upon the wafer being conveyed in and out, any unnecessary oxide film is previously prevented from adhering to the wafer 1.</p> |
