METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE, IN WHICH A PHOTOLACQUER MASK IS FORMED BY MEANS OF A TWO-LAYER LACQUER SYSTEM,申请号EP19860200217-传众专利搜索

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发明名称	METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE, IN WHICH A PHOTOLACQUER MASK IS FORMED BY MEANS OF A TWO-LAYER LACQUER SYSTEM
摘要
申请公布号	EP0192302(B1)	申请公布日期	1990.05.02
申请号	EP19860200217	申请日期	1986.02.17
申请人	N.V. PHILIPS' GLOEILAMPENFABRIEKEN	发明人	VOLLENBROEK, FRANCISCUS ANTONIUS;DIL, JAN GERARD;KROON, HENRICUS JOHANNES JACOBUS;SPIERTZ, ELISABETH JACOBA;NIJSSEN, WILHELMUS PETER MARTINUS
分类号	G03F1/00;G03F7/26;G03F1/08;G03F7/095;G03F7/20;H01L21/027;H01L21/30	主分类号	G03F1/00
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