| 摘要 |
PURPOSE:To smoothly and stably perform etching by quantitatively sending gaseous oxygen into a cupric chloride-based etchant immediately before the etchant is sprayed on a member to be etched. CONSTITUTION:Since gaseous oxygen is quantitatively supplied to the etchant 2, an anionic complex, etc., are not formed, and cuprous oxide scales can be smoothly dissolved as cupric ion. As a result, etching is smoothly and stably carried out, and a clear etched surface is obtained. The gaseous oxygen is supplied to the etchant 2 immediately before the etchant 2 is sprayed. Accordingly, the gas unneeded by the dissolution reaction in etching is discharged into the atmosphere simultaneously with the spraying of the etchant. As a result, the unneeded gas is not mixed into the etchant 2 to be circulated and used, the function of a pump is not deteriorated, and the etchant 2 can be stably circulated and sprayed. |
