METHOD FOR FORMING AN INORGANIC THIN FILM ON A SUBSTRATE WITH USE OF A TARGET

摘要

An inorganic thin film is deposited on a substrate by sputtering a sputter target by cathode sputtering in the vicinity of the substrate. To produce the target, at least two pulverulent starting components are mixed. The mixture is tempered if a uniform reaction product can be obtained in this process. It is powdered and the powder is deposited on a metallic base by plasma-jet spraying. This produces the target. Preferably, an oxide mixture is tempered which is a starting product for a superconducting ceramic material. In order to convert the thin film deposited to a superconducting state, it is treated for a prolonged time at temperatures of 300 DEG -800 DEG C. in an oxygen-containing atmosphere. The reaction product obtained on tempering may have, for example, the overall composition ZBamCunOx, where 1.5