发明名称 MASK CLEANING PROCESS
摘要 PURPOSE:To prevent a cleaning solution from deteriorating as well as a substrate from damaging by a method wherein tne cleaning solution is used as an electrolyte solution while a substrate to be cleaned up used as an electrode and the counter electrode are impressed with a voltage. CONSTITUTION:A substrate to be cleaned up is used as an electrode; the counter electrode is provided in a cleaning solution as an electrolyte; a power supply is provided between both electrodes using the cleaning solution as an electrolyte. Consequently, when a voltage is impressed through the cleaning solution, an electrochemical reaction using the substrate itself as an electrode while using inert metal as the other electrode is caused to produce an active specie so that the substrate may be cleaned up by the reaction of the active species to the dust or organic matter on the substrate surface. Through these procedures, the cleaning solution can be prevented from deteriorating doing no damage to the substrate since no acid is used as an active species producing agent.
申请公布号 JPH02102529(A) 申请公布日期 1990.04.16
申请号 JP19880254916 申请日期 1988.10.12
申请人 MATSUSHITA ELECTRON CORP 发明人 HAGI TOSHIO;OGURA TAKETOSHI
分类号 B08B3/10;G03F1/82;H01L21/304 主分类号 B08B3/10
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