| 摘要 |
PURPOSE:To enable measurement of the shape of a resist pattern and the verticality thereof, in particular, in an efficient and quantitative manner by applying a coherent light onto the pattern formed at equal intervals and by measuring the intensity of a primary diffracted light obtained by diffraction by the pattern. CONSTITUTION:A part of a laser light 2 emitted by a light source 1 is transmitted through a half mirror 3 and falls on a sample (whereon stripe-shaped resist patterns are formed at equal intervals) 5 (of which an inclination angle is set to be theta1=1 to 20 degrees so as to collect only a primary diffracted light). The intensity of the light diffracted and reflected on the surface of the sample 5 is detected by a photodetector 12, and a voltmeter 14 measures the intensity of the primary diffracted light. Besides, a light 14 of the laser light 2, which is reflected by the mirror 3, is measured as an intensity reference light by a photodetector 17. The intensity of the diffracted light and that of the reference light thus obtained are subjected to A/D conversion 18 and sent to CPU 19 and are subjected therein to a standardizing processing (for correction of variation of the laser light itself). It is known therefrom that the lower intensity of the primary diffracted light shows the less flat parts of the slit-shaped resist patterns. |
