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发明名称
HEAT TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE AND ITS DEVICE
摘要
申请公布号
JPH0279434(A)
申请公布日期
1990.03.20
申请号
JP19880231719
申请日期
1988.09.14
申请人
NEC CORP
发明人
YOSHIDA TAKUKATSU
分类号
H01L21/28;H01L21/324
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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