| 摘要 |
PURPOSE:To suppress thermal expansion of the whole film, by uniformly irradiating visible light or infrared light onto a particle adhering surface, and selectively heating and destaticizing a charge pattern holding part. CONSTITUTION:On a film base 11, a conductive layer 12 and a dielectric layer 13 are provided in order, and light-heat converting particles 2 which are >=70% in its visible or infrared light absorption factor, also are <=1X10<6>OMEGA/cm<2> or >=1X 10<10>OMEGA/cm<2> in its surface resistance, and have been charged to positive or negative in advance are made to contact with the surface of a dielectric film 1 which has held a charge pattern on the surface in advance. In this way, when the particles are electrostatically attracted and made to adhere to the charge pattern holding, part, and subsequently, visible or infrared light is uniformly irradiated to this particle adhering surface from a light source 3, the charge pattern holding part is selectively heated and destaticized. |
