| 摘要 |
PURPOSE:To obtain a developer having superior developing stability, high developing ability and low foaming property over a long period and especially suitable for use in an automatic developing machine by adding a specified alkali metal silicate and a specified water soluble ethylene oxide adduct. CONSTITUTION:This developer contains an alkali metal silicate having 0.6-2.0 ratio of SiO2 to M2O (M is the alkali metal) and a water soluble ethylene oxide adduct obtd. by adding >=4mol ethylene oxide to an acid, aliphat. or arom. alcohol or a hydroxy compd. or compd. is made from an acid and the ethylene oxide by addition-condensation or further bonding sulfonic acid or sulfonate. The developer has high developing stability, easily undergoes control of developing conditions and also has high developing ability, so a large amt. of a photosensitive material can be developed with a small amt. of the developer. |
