| 摘要 |
PURPOSE:To allow the exact formation of fine patterns even on a substrate having steps by using a specific silicone compd. as an intermediate layer. CONSTITUTION:The three-layered structure resist contg. the silicone compd. produced by substituting the hydrogen atom of the silanol group contained in the silicone compd. expressed by formula III by the group expressed by formula II as the intermediate layer 3 is used. In formula I, R<1> denotes a vinyl group or aryl group; R<2> denotes an aryl group; (l), (m), (n) are respectively 1-10000 positive integer. In formula II, R3-R5 denote 1-4C alkyl group; 2-4C alkenyl group or aryl group, either two of the three or the three of which may be the same. Excellent oxygen plasma resistance is obtd. and the film formation is facilitated. |
