An X-ray mask having a mask pattern formed from nickel or a material having nickel as a principal component supported on a thin membrane. The X-ray mask has characteristics substantially equal to those of the conventional X-ray mask employing Au as a mask pattern and is much lower in price than the Au-containing mask pattern. In addition, since the X-ray mask can easily be formed by electroless plating, it is possible to form a mask pattern with a higher accuracy than that in case of employing Au alone.
申请公布号
DE3381021(D1)
申请公布日期
1990.02.01
申请号
DE19833381021
申请日期
1983.09.13
申请人
HITACHI, LTD., TOKIO/TOKYO, JP
发明人
KIMURA, TAKESHI, HIGASHIMURAYAMA-SHI TOKYO, JP;OBAYASHI, HIDEHITO, NERIMA-KU TOKYO, JP;MOCHIJI, KOZO, TACHIKAWA-SHI TOKYO, JP