Process for removing gaseous impurities by adsorption

摘要

To remove gaseous impurities by adsorption, an adsorption medium film of fibrous construction is used. For the adsorption of helium, (particularly at very low temperatures) graphite film can be used. In this manner, insulation vacua, such as for example for He cryostats etc, can be kept gas-free. The adsorption medium film is simpler to handle here in comparison with an adsorption medium packing.