| 摘要 |
PURPOSE:To precisely inspect the thick defect and thin defect of a pattern by dividing a memory part into plural blocks, calculating places to shown an abnormality for each block, comparing them with a threshold value and judging the distribution condition of the blocks to show the abnormality. CONSTITUTION:First, the length in the width direction of the pattern is measured in a pattern width measuring part 1. Next, its size is compared with that of a prescribed value (standard pattern width) in a comparing part 2. Pattern width measuring data are developed to two dimensions and stores in a memory part 4 of a defect detecting part 3. Next, the memory part 4 where the data are stored is divided into the plural blocks, the data of each block are sent to a number-of-pieces comparing part 5. The number-of-pieces comparing part 5 calculates the places where the data of the pattern comparing part 2 shows the abnormality and decides whether or not their values exceed a large value. When the blocks which exceed the threshold value continue vertically, horizontally, or obliquely, it is judged that there is a pattern defect. |
