| 摘要 |
PURPOSE:To form a fine rectangular contact hole by providing a couple of rectangular mask patterns across a specific separation area. CONSTITUTION:This is a photomask using a chromium thin plate and the couple of rectangular mask patterns 2A and 2B (opening part) are bored adjacently so that their one-side parts face each other across the separation area 1. Here, the patterns 2A and 2B are formed to such size that they can be exposed to UV light, etc., and the area 1 is formed to such width that it is not exposed to and resolved with the UV light, etc. This mask is used to form the contact hole by photoetching and then the fine rectangular contact hole 3 is formed with good resolution. |
