发明名称 FORMATION OF CARBON FILM
摘要 PURPOSE:To form a high-quality carbon film on a great number of substrates once irrespective of electrical conductivity of the substrates, by setting an electrical conductor directly on the face of substrates not to be coated or in the vicinity of the face, making electrolytic relation to provide a cathode side with sputtering effects and enlarging reaction space thereof. CONSTITUTION:Faces to be coated are set in a cylindrical structure 2, a pair of electrodes 3 and 3' are set at one opening and the other of the cylindrical structure 2 and one end 4 and the other 4' of a matching coil 16 are connected to a pair of the electrodes 3 and 3' to impress mutually symmetrical or approximately symmetrical alternating electric fields to the electrodes. Second electric fields 17 are impressed through a third electrode (electrical conductor) which has a face opposite to the face to be coated, namely a shape similar to the face not to be coated and is fast stuck to the face not be coated, brought into contact with the face not to be coated or set in the vicinity of the face not to be coated to space between the middle point of the matching oil 16 and the cylindrical structure 2, a holder or substrates 1. A reactive gas of a hydride or fluoride of carbon is introduced into the interior 60 in the structural cylinder 2, the reactive gas is made into plasma to form coating films made of carbon or consisting essentially of carbon on the surface of the substrates 1.
申请公布号 JPH01286911(A) 申请公布日期 1989.11.17
申请号 JP19880117792 申请日期 1988.05.13
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI
分类号 C01B31/04;C01B31/06;C23C16/26;C23C16/27;C23C16/50;C30B25/02;H01L21/205 主分类号 C01B31/04
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