| 摘要 |
PURPOSE:To reduce the labor hour of a manufacturing process, and to improve the accuracy of finishing of etching by interposing a thin-film composed of molybdenum among a pair of electrode films consisting of aluminum and a resistance film. CONSTITUTION:A thin-film 4 made up of molybdenum is formed onto the surface of a resistance film 3 as a reaction preventive layer, an electrode film 5 composed of an aluminum group is shaped onto the thin-film 4, a resist film 6 is patterned with the exception of the central section 5a of the electrode film 5, the electrode film 5 and the thin-film 4 consisting of molybdenum are isolated at every dot by an etchant mainly comprising phosphoric acid, and the central section 5a of the electrode film 5 and the central section 4a of the molybdenum thin-film 4 are removed. Consequently, pairs of thin-films 4b, 4c and electrode films 5b, 5c are shaped, and the central section 3a of the resistance film 3 is exposed among the pairs of the thin-films and electrode films. The resist film 6 remaining on a pair of the electrode films 5b, 5c is removed, and a protective film 7 is formed so as to coat a pair of the electrode films 5b, 5c and the central section 3a of the resistance film 3 positioned between the electrode films 5b, 5c. |
