| 摘要 |
PURPOSE:To form resist patterns having high resolution with good reproducibility by using an alkaline soluble resin and 1,2-quinone diazide compd. as essential components and compounding a pyrazolone compd. having specific skeleton therewith. CONSTITUTION:The alkaline soluble resin and 1,2-quinone diazide compd. are used as the essential component and the pyrazolone compd. having the skeleton expressed by the formula (I) is compounded therewith. The pyrazolone compd. in the resist film can, therefore, be incorporated stably into this resist compsn. even if the resist compsn. is coated on a substrate on which an aluminum film having high reflectivity is coated or said compsn. is coated on a substrate consisting of chromium and is then prebaked. Therefore, the halation at the time of exposing of the resist film after prebaking is then prevented by the pyrazolone compd. and the good resist pattern having no degradation in the resolution by the halation arising from the subsequent development with an aq. alkaline soln. is thereby obtd. with good reproducibility. |
