CHEMICAL LIQUID TREATING EQUIPMENT FOR SEMICONDUCTOR WAFER,申请号JP19880071407-传众专利搜索

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发明名称	CHEMICAL LIQUID TREATING EQUIPMENT FOR SEMICONDUCTOR WAFER
摘要
申请公布号	JPH01243425(A)	申请公布日期	1989.09.28
申请号	JP19880071407	申请日期	1988.03.24
申请人	NEC KYUSHU LTD	发明人	YANABE YUKIHIRO
分类号	B05C11/08;G03F7/16;H01L21/027;H01L21/30	主分类号	B05C11/08
代理机构		代理人
主权项
地址

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