| 摘要 |
PURPOSE:To simplify an X-ray exposure system by forming a recessed region onto a mask substrate supporter through etching and using a stepped section between a top face and an underside as a gap between a mask and a sample at the time of X-ray exposure. CONSTITUTION:A region including a region, in which a mask substrate 16 must be shaped, on the surface side of a mask substrate supporter 15 is shaved previously through etching, and dug down only by the depth of a gap between a mask and a sample 19 at the time of exposure and a recessed region is formed, and an X-ray transmitting thin-film (a mask substrate) 16 is applied onto the surface of the supporter. Consequently, a stepped section is shaped between the surface of the sup porter 15 and the surface of the mask substrate 16, and the stepped section is utilized as a spacer at the time of exposure. As a result, the spacer need not be inserted into an exposure device in order to adjust the gap between the mask and the sample 19 on exposure and the gap be measured. Accordingly, an X-ray exposure system can be simplified. |
