发明名称 Method for producing thin, strip-shaped silicon crystals having a planar surface, suitable for fabrication of solar cells
摘要 Planar silicon strips (3) having a smooth surface are obtained - in a process in which the substrate body (1) employed is a graphite net which is passed tangentially across a silicon melt (2) held in a trough (6) and is thus coated with silicon - by there being arranged, downstream of the growth section (W) proper, a melting section (A). The latter consists of a cover (5) above the melt surface (2) whose temperature T1 is set in such a way that it is greater than or equal to the mean temperature T2 on the net-side surface of the substrate body (3) coated with silicon. The process is used in the production of silicon strips for solar cells, the substrate bodies used being carbon fibre nets (1) having internal mesh sizes of greater than 1.5 mm. <IMAGE>
申请公布号 DE3803769(A1) 申请公布日期 1989.08.17
申请号 DE19883803769 申请日期 1988.02.08
申请人 SIEMENS AG, 1000 BERLIN UND 8000 MUENCHEN, DE 发明人 HOYLER, GERHARD, DIPL.-PHYS.;FALCKENBERG, RICHARD, DR.RER.NAT., 8000 MUENCHEN, DE;GRABMAIER, JOSEF, DR.RER.NAT., 8137 BERG, DE
分类号 C30B15/06;C30B15/00;C30B15/34;C30B29/06 主分类号 C30B15/06
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