发明名称 |
Apparatus and methods for ion implantation |
摘要 |
A system for implanting ions into a target element including a source arrangement for producing an ion beam; a beam analyzing arrangement for receiving the ion beam and selectively separating various ion species in the beam on the basis of mass to produce an analyzed beam; and a beam resolving arrangement disposed in the path of the analyzed beam for permitting a preselected ion species to pass to the target element. The analyzing arrangement has an ion dispersion plane associated therewith. The source arrangement has an associated ion emitting envelope including an area of substantial extension in a plane parallel to the ion dispersion plane and producing ions entering said analyzing arrangement which are travelling substantially either toward or from a common apparent line object lying in a plane perpendicular to the ion dispersion plane.
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申请公布号 |
US4847504(A) |
申请公布日期 |
1989.07.11 |
申请号 |
US19860832327 |
申请日期 |
1986.02.24 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
AITKEN, DEREK |
分类号 |
H01J27/02;H01J27/14;H01J37/05;H01J37/08;H01J37/317;H01J49/30 |
主分类号 |
H01J27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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