发明名称 SINGLE EXPOSURE POSITIVE CONTACT LITHO FILM
摘要 Multilayer photosolubilizable litho element comprising (1) support, (2) photosolubilizable dye or pigment-containing layer having an optical density in the visible region of the spectrum of at least 2.0 comprising a quinone diazide and at least one polymeric binder, and (3) photosolubilizable layer comprising a quinone diazide compound and at least two polymeric binders having carboxylic acid substituents, one binder being poly(methylmethacrylate/methacrylic acid). The element is useful as a single exposure positive contact litho film.
申请公布号 DE3379983(D1) 申请公布日期 1989.07.06
申请号 DE19833379983 申请日期 1983.10.27
申请人 E.I. DU PONT DE NEMOURS AND COMPANY 发明人 DUEBER, THOMAS EUGENE
分类号 G03C1/72;G03F1/56;G03F7/022;G03F7/023;G03F7/095;G03F7/105;(IPC1-7):G03F7/02;G03F7/08 主分类号 G03C1/72
代理机构 代理人
主权项
地址