| 摘要 |
PURPOSE:To reduce a time required for by deciding a scanning range automatically in a process of mapping instead of setting a scanning area previously so as not to scan the area where there is no sample. CONSTITUTION:As electron pulse microanalyzer(EPMA) is composed of an electron gun 1, the objective lens 2 of an electron optics system, a sample stage 3, a moving device 4 in the X, Y and Z axis directions, a spectral crystal 5 and a X-ray detecting unit 6 and the like. An automatic focusing detecting means 11 is provided in an optical microscope attached to this EPMA, and whether an electron beam irradiation point is on a sample S surface or not is distinguished by whether a sample S surface is detected in a defined range in the optical axis direction or not at the time of scanning the sample S surface, and the scanning direction is inverted where a state that the sample S surface is detected changes to a state that it is not detected. With this arrangement, a scanning range is automatically decided in compliance with the form of the sample, and a useless range is not scanned, and thereby a required time for mapping is reduced. |
