| 摘要 |
PURPOSE:To supply a developing solution uniformly in a radial direction of a wafer, by providing a supply port of the developing solution which extends in the radial direction of the wafer, or several pieces of supply ports. CONSTITUTION:A leading end of a nozzle 1 extends in a radial direction of the wafer, and a slender, slit like supply port 2 for a developing solution is opened over a certain range in a lower surface of the extending pipe 1b in such a way that its width is smaller at a position nearer the tip or a plurality of supply ports 3 for the developing solution are provided in the lower surface of the extending pipe 1b in a row at regular pitches. The nozzle 1 is made of a stainless steel or teflon pipe and the pipe 1b extending from the nozzle 1 is slightly longer than the radius of each wafer. Thus, as the developing solution is simultaneously given dropwise from the supply port 2 of the nozzle 1 to radial regions of the wafer that are rotating, no time difference takes place upon development in the surfaces of wafers and then, the whole is developed uniformly. |
