VORRICHTUNG ZUM CHEMISCHEN BEDAMPFEN MITTELS LASER UNTER VERWENDUNG VON LICHTLEITFASERN

摘要

Apparatus for performing laser chemical vapor deposition (LCVD) as illustrated in Fig 2 uses a laser beam (204) which is transmitted into a reaction chamber (214), containing a workpiece (218) being subjected to LCVD, via an optical fiber (210). In several embodiments, the gaseous reactant is introduced into the proximity of the workpiece by means of a gas nozzle (242) affixed to an output coupling means (226) for focussing the laser beam emitted at the output end of said fiber onto at least a portion of the predetermined region of the workpiece so that the gaseous reactant is deposited thereon. <IMAGE>