发明名称 PRODUCTION OF SILICON CARBIDE HAVING LARGE SPECIFIC SURFACE AREA AND USE THEREOF IN HIGH TEMPERATURE CATALYTIC REACTION
摘要 Process for production of fine particles of silicon carbide, consisting of an agglomerate of submicron particles which have a specific surface of at least 100 m<2> g<-><1>, intended especially for use as a catalyst support for petroleum chemistry and for catalytic reactions at elevated temperature which may be up to 1000 DEG C, this process consisting in reacting silicon monoxide SiO vapour over carbon, being characterised in that:… - SiO vapour is generated in a first reaction zone by heating a mixture of SiO2 + Si (10) to a temperature of between 1100 and 1400 DEG C at a pressure of between 0.1 and 1.5 hPa;… - in a second reaction zone the SiO vapour is brought into contact with reactive carbon (12) in divided state, with a specific surface of at least 200 m<2> g<-><1> at a temperature of between 1100 and 1400 DEG C. …<??>The reactive carbon is preferably doped by an addition of 1 to 10 % by weight of a metallic element chosen from uranium, cerium, titanium, zirconium, hafnium and the lanthanides. …<IMAGE>…
申请公布号 JPH01131016(A) 申请公布日期 1989.05.23
申请号 JP19880263832 申请日期 1988.10.19
申请人 PESHINE EREKUTOROMETARURUJI 发明人 MARUKU JI RUDOU;JIYANNRUI GIYU;SHIRUBAN HANTSUEERU;DOMINIKU DOYUBO
分类号 B01D53/86;B01D53/94;B01J27/224;C01B31/36;C10G49/02 主分类号 B01D53/86
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