发明名称 SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURE THEREOF
摘要 PURPOSE:To prevent the lowering of a read signal level, and to increase working speed by forming a read (a second MOS type) transistor operated by a write signal and shaping a diode connected in series with a drain region in the transistor. CONSTITUTION:A gate electrode for a write transistor 41 having n-type MOS structure is connected to a write word line 40 for information and a source electrode for the transistor 41 to a bit line 42 in a circuit, and a drain electrode for the transistor 41 is connected to a gate electrode as a capacitance section in a read transistor 43 having P-type MOS structure. The drain electrode is connected to the bit line 42 through a protective diode 44 for preventing the operation of the transistor 43 at the time of write in series, and a source electrode for the transistor 43 is connected to a read word line 45 for information. An N<+> type diffusion layer 25 is shaped as a gate electrode, an N<-> type polysilicon layer 30 as a channel section, and P<+> type polysilicon layers 32 as a source electrode and a drain electrode in the read transistor 43 at that time. Accordingly, the lowering of a read signal level is obviated, and working speed is increased.
申请公布号 JPH01122155(A) 申请公布日期 1989.05.15
申请号 JP19870279037 申请日期 1987.11.06
申请人 OKI ELECTRIC IND CO LTD 发明人 ITO HIDEKI
分类号 H01L27/10;H01L21/8242;H01L27/108 主分类号 H01L27/10
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