HIGH DOSE ION IMPLANTATION DEVICE,申请号JP19870251608-传众专利搜索

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发明名称	HIGH DOSE ION IMPLANTATION DEVICE
摘要
申请公布号	JPH0195455(A)	申请公布日期	1989.04.13
申请号	JP19870251608	申请日期	1987.10.07
申请人	OKI ELECTRIC IND CO LTD	发明人	IWAMURA SHIRO
分类号	H01J27/08;H01J37/08;H01J37/317	主分类号	H01J27/08
代理机构		代理人
主权项
地址

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