发明名称 Semiconductor device
摘要 PCT No. PCT/JP86/00443 Sec. 371 Date May 4, 1987 Sec. 102(e) Date May 4, 1987 PCT Filed Aug. 29, 1986 PCT Pub. No. WO87/01522 PCT Pub. Date Mar. 12, 1987.A novel method which enables a quaternary III-V group crystal to be readily formed on a III-V group crystal so that the former crystal lattice-matches with the latter crystal. More specifically, it is easy to produce a superlattice structure on a III-V group crystal substrate, the superlattice structure consisting of a first III-V group (hereinafter referred to as "III1-V1") binary crystal layer which lattice-matches with the substrate, and a III-V group (III1-III2-V2) ternary crystal layer which similarly lattice-matches with the substrate. It is possible to obtain an even more stable superlattice layer by selecting the ratio between the film thickness of the (III1-V1) crystal and the film thickness of the (III1-III2-V2) crystal so that, when the superlattice structure is mixed-crystallized spontaneously or by means of impurity doping, the mixed-crystallized composition lattice-matches with the previous crystal.
申请公布号 US4819036(A) 申请公布日期 1989.04.04
申请号 US19870060869 申请日期 1987.05.04
申请人 HITACHI, LTD. 发明人 KURODA, TAKAO;WATANABE, AKIYOSHI;TSUJI, SHINJI;OHISHI, AKIO;MATSUMURA, HIROYOSHI
分类号 H01S5/00;H01L29/15;H01L29/80;H01L31/10;H01L33/00;H01S5/34;H01S5/343 主分类号 H01S5/00
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