| 摘要 |
PURPOSE:To form a fine oxide superconducting line suitable for integrated circuit, by a method wherein, after an oxide superconducting thin film vapor- grown on a substrate is subjected to patterning in a desired wiring figure, crystallization in a structure having superconductivity is performed by heat-treating in an atmosphere containing oxygen. CONSTITUTION:On a substrate 11, an oxide superconducting film 12 having a composition approximate to stoichiometric composition YBa2Cu3O7 is stuck. By usual lithography process, an etching maek is formed on the oxide superconducting film 12. By ion-milling method, the oxide superconducting film 12 is processed, and an oxide superconducting line pattern 13 is formed. Since the surface of the oxide superconducting film 12 is smooth, a fine pattern in the range of about 1mum can be easily formed. A sample provided with the oxide superconducting line pattern 13 is subjected to heat treatment at 850-1000 deg.C in oxygen flow for several hours, and gradually cooled to form an oxide superconducting line 14 having high temperature superconductivity. |
