发明名称 Method of forming conductive path by low power laser pulse
摘要 An integrated circuit device including a link point for electrically connecting a plurality of metal layers, comprising a first metal layer, a link insulating layer and a second metal layer. Diffusion barrier may be employed between the link insulator layer and each of the first metal layer and the second metal layer. The metal layers are connected by exposing the link point to a low-power laser for a relatively long pulse width.
申请公布号 US4810663(A) 申请公布日期 1989.03.07
申请号 US19860260096 申请日期 1986.05.06
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY 发明人 RAFFEL, JACK I.;YASAITIS, JOHN A.;CHAPMAN, GLENN H.;NAIMAN, MARK L.;BURNS, JAMES A.
分类号 H01L21/268;H01L21/768;(IPC1-7):H01L21/265 主分类号 H01L21/268
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