发明名称 Thin film mos transistor having pair of gate electrodes opposing across semiconductor layer.
摘要 <p>A thin film MOS transistor (1) has a construction which can minimize scattering of electron and thus maximize electron mobility for allowing higher speed operation of the transistor. Toward this, the MOS transistor has a thin film form semiconductor layer (5) having a thickness in a range less than or equal to 100 nm, between a pair of gate electrodes (3, 7) which oppose to each other across the semiconductor layer (5).</p>
申请公布号 EP0304824(A2) 申请公布日期 1989.03.01
申请号 EP19880113531 申请日期 1988.08.19
申请人 SONY CORPORATION 发明人 HAYASHI,HISAO SONY CORPORATION;NEGISHI, MICHIO SONY CORPORATION;NOGUCHI, TAKASHI SONY CORPORATION;OSHIMA, TAKEFUMI SONY CORPORATION;HAYASHI, YUJI SONY CORPORATION;MAEKAWA, TOSHIKAZU SONY CORPORATION;MATSUSHITA, TAKESHI SONY CORPORATION
分类号 H01L29/78;H01L29/786 主分类号 H01L29/78
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