| 摘要 |
PURPOSE:To execute a defect inspection of a regular pattern, which does not overlook a continuous shape defect except the edge part of the pattern, by limiting an area for discriminating the edge part of the pattern. CONSTITUTION:A pattern to be inspected 5 is irradiated by parallel laser light 4, and is detected by a photodetecting array 11 through diffraction light 6, a Fourier converting lens 7 and a space frequency filter 8. In this case, not only a regular pattern 50 but also longitudinal and lateral edge parts 5Y, 5X of an edge inside 16 are mixed with a usual defect, therefore, the regular pattern area is surrounded by a line 17, and a shape area in this area is all regarded as the usual defect. When viewing from the photodetecting array 11 side, the array 11 is fixed, a pattern moving device 72 for moving the pattern 50 is moved in the Y axis and X axis directions by a driving device 71, and the respective Y and X positions are derived by each Y and X position generating device 73, 74. |
