UNDERWATER OXIDATION OF SEMICONDUCTOR WAFER,申请号JP19870201718-传众专利搜索

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发明名称	UNDERWATER OXIDATION OF SEMICONDUCTOR WAFER
摘要
申请公布号	JPS6445130(A)	申请公布日期	1989.02.17
申请号	JP19870201718	申请日期	1987.08.14
申请人	HITACHI LTD	发明人	MATSUZAKI HARUMI;OKOCHI ISAO;KUROKAWA HIDEAKI;EBARA KATSUYA;TAKAHASHI SANKICHI;HISHINUMA TAKAO
分类号	H01L21/316	主分类号	H01L21/316
代理机构		代理人
主权项
地址

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