发明名称 DEVELOPER COMPOSITION AND TREATMENT OF PHOTOSENSITIVE MEMBER
摘要 PURPOSE: To reduce the toxicity of a developer, to make the developer neutral and to develop various kinds of planographic printing plates by imparting a specified compsn. CONSTITUTION: This developer compsn. has about pH 6.5-7.5 and contains about 0.1-20% one or more among sodium octylsulfate, sodium tetradecylsulfate, ammonium laurylsulfate, etc., based on the weight of a developer, about 0.1-30% one or more kinds of Li salts of hydroxy- aryl- and alkylcarboxylic acids, about 0.1-30% one or more kinds of K salts of hydroxy-, aryl- and alkylcarboxylic acids and about 0.5-3.0% phenoxypropanol-base solvent or further contains an enough acid or base to adjust the developer to the desired pH, prescribed amts. of a defoaming agent and a buffer agent if necessary.
申请公布号 JPS6444445(A) 申请公布日期 1989.02.16
申请号 JP19880184779 申请日期 1988.07.26
申请人 HOECHST CELANESE CORP 发明人 SHIEEN HIJII
分类号 G03F7/00;G03F7/32 主分类号 G03F7/00
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